Development of doubled haploid mapping population for drought tolerant high chapati quality Indian wheat variety C306 using wheat x maize system
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Authors
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Sapna Grewal
National Research Center on Plant Biotechnology, New Delhi 110 012
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Anupreet Kour
National Research Center on Plant Biotechnology, New Delhi 110 012
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Ratan Tiwari
Directorate of Wheat Research, Karnal, Haryana 132 001
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Suresh Chand
Department of Life Sciences, Devi AhilyaVishwavidyalaya, Indore 452 017
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K. Vinod Prabhu
Department of Life Sciences, Devi Ahilya Vishwavidyalaya, Indore 452 017
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Nagendra K. Singh
National Research Center on Plant Biotechnology, New Delhi 110 012
Abstract
Doubled haploid (DH) technology allows production of pure homozygous lines in a single generation. Integration of DH
technology in wheat breeding programmes and genetic studies has the potential to reduce the breeding time for new varieties and enhance our understanding of the genetics of important agronomic traits. A protocol was standardized for the production of DH wheat plants using
wheat into maize hybridization system and a mapping population of sixty DH wheat lines was produced involvingdrought tolerant high chapati quality Indian wheat varietyC306 and a poor quality variety WH157. Factors were identified for efficient production of DH plants, including early excision of the haploid embryos after pollination, low
temperature treatment of the excised embryos and use of lower concentration of colchicine solution for longer time for the chromosome doubling of the haploid plantlets.